Surfactants play an important role in the manufacture and processing of metals, paper, plastics and other materials critical to manufacturing.
Legendtek supplies high performance chemicals to these production plants. There are processing agents such as cleaners and defoamers, as well as penetrating wetting agents that add value to materials.
Surfactants play an important role in the manufacture and processing of metals, paper, plastics and other materials critical to manufacturing.
Legendtek supplies high performance chemicals to these production plants. There are processing agents such as cleaners and defoamers, as well as penetrating wetting agents that add value to materials.
W-63
Non-Silicone-based Defoamer
CLEAR Series
General Cleaner
CLEAN L-Series
General Alkaline Cleaner
AS-300R
Anti-bacterial and Deodorant
600E
Silicone-based Water Repellent
400
General Silicone-based Defoamer
KF-128
Protective and Brightening Coating Agent
SP-Series
General Alkaline Cleaner
NXH-6022
Self-emulsifying Silicone Defoamer
BK-Series
Nonionic Surfactant
P-312
Nonionic Surfactant
SR-80
Nonionic Surfactant
SN-10
Wetting and Defoaming Agent
DP-0100
Stabilizer for Hydrogen Peroxide
NA-30
Alkali-resistant Wetting Agent
A-860
Chelating Agent
AC-1100
Chelating and dispersing agent
PEAKLON 350
Acid-resistant Wetting Agent
U-852
Acid-resistant Addtive
LIPO-OIL Series
Oiling Agent and Lubricant
RB-Series
Anti-bacterial and Anti-odor Agent
AMIPOL Series
Anti-static Agent
C6DFOH-BF
Perfluorooctanol
C6FMA-BK
Perfluorohexylethyl Methacrylate
PT-Series
Perfluoro-Polyether
AF-Series
Antifouling and Anti-fingerprint agent
FN-Series
Fluorocarbon based nonionic surfactant
EVAFANOL Series
Water-based Polyurethane Dispersions
NK Series
Water-based Cross-linking Agent
Cerox® 2610
High-performance polishing for polishing wheels, lenses, crystals, and more
Cerox® 2610 is a classic traditional polishing powder product, which is mainly used for polishing in traditional fields such as polishing wheels, lenses, crystals, optics, etc. The product has moderate particle size, high cutting rate and wide adaptability.